[Product] GRAPHITE

GRAPHITE



Lithium Ion, Polymer battery consists of cathode,anode and separator, etc. The materials are: Lithium Cobalt Oxide for cathode, Graphite Powder for anode.



Also applicable to Bio-related product.

Special Features

DAG Series shows high capacity, high efficiency and superior cycle life. Sophisticatedly-treated surface for high conductivity performance. Sophisticatedly-crystallized with good R/H ratio for high capacity

            Sohericalizen graphite powder
            (potato type & sphere type)            Sophisticatediy-treated granule surface

SPEC



Click here to get more information

[Product] DCS

DCS

DCS(SiH2 Cl2) is used in the semiconductor process.

This is a silicon precursor gas used in combination with ammonia for SiH4 CVD.

DCS is also used for edposition of epitaxial silicon.

SPEC



Click here to get more information

[Product] WF6

 

WF6

WF6 is used in the semiconductor process.

It makes contact plugs during CVD process.



SPEC

Click here to get more information



[Product] SiH4

SiH4

SiH4 is used in the manufacturing process of semiconductors, TFT-LCD and thin film solar cells. This is used to deposit silicon on wafer in semiconductors and to deposit silicon on TFT(thin film transistor) on top of glass substrate for TFT-LCD.

This gas in expected to show increased demand with NF3 gas, following continued expansion of semiconductor, TFT-LCD and thin film sola cell lines.

SPEC

Click here to get more information



[Product] NF3

NF3

“NF3-a gas to prevent dust or other particle contamination in TFT (Thin Film Transistor) and semiconductor production"

NF3 is used in the mabufacturing process of semiconductors, TFT-LCD and solar cells. After deposition sithin the CVD chamber, NF3 is injected to remove any residues on the internal walls of the chamver.

Injectde NF3 chemically reacts with residues in the chamber to remove them.

SPEC



Click here to get more information

[Company] OCI Materials Co., Ltd.

Something Different, So Different


Under the spirit of adventure, challenge, and perseverance, OCI Materials has been developing advanced materials since its establishment in 1982. Actually, the present company name, OCI Materials, started to be used from 2004. In addition, from this time, OCI Materials began to take steps towards becoming a global advanced material corporation equipped with high technical skills and production capacity.

Korea has long been relying on imports of electronic materials. Keeping pace with the age of the development of the production of electronic materials, OCI Materials developed special abrasives (garnet, cerium), anode active materials (graphite) for secondary cells, and special gases such as NF3 (nitrogen trifluoride), WF6 (tungsten hexafluoride), and SiH4 (monosilane) for semiconductors, TFT-LCD, and solar cells.

As a result, OCI Materials is now acknowledged as a company that grew remarkably over the past 10 years. OCI Materials is now striving to settle its position with an increased market share of the global market based on accumulated capacity from the newly built 4th NF3 factory and the 2nd SiH4 factory. OCI Materials was also designated as a representative 'low carbon, green growth' company – the core project of the Korean government. Therefore, OCI Materials is exporting the basic material called SiH4 (monosilane). SiH4 is an essential material to produce solar cells – a growth engine of the next generation.


Global Partner of the World-Class Semiconductor Manufacturers

The superiority of OCI Materials products is recognized by Samsung Electronics, LG LCD, Hynix, and so on. Moreover, OCI Materials differentiated products (NF3, SiH4, etc.) made possible the success of American, European, Chinese, and other global semiconductor manufacturing process markets. Therefore, OCI Materials could become a company which has the No. 2 market share in the world.


Click here to get more information